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An interconnect width and spacing optimization model considering scattering effect
Authors:Zhu Zhang-Ming  Wan Da-Jing  Yang Yin-Tang
Abstract:As the feature size of the CMOS integrated circuit continues to shrink, the more and more serious scattering effect has a serious impact on interconnection performance, such as delay and bandwidth. Based on the impact of the scattering effect on latency and bandwidth, this paper first presents the quality-factor model which optimises latency and bandwidth effectively with the consideration of the scattering effect. Then we obtain the analytical model of line width and spacing with application of curve-fitting method. The proposed model has been verified and compared based on the nano-scale CMOS technology. This optimisation model algorithm is simple and can be applied to the interconnection system optimal design of nano-scale integrated circuits.
Keywords:scattering effect  curve fitting  interconnection line dimensions  nanometer integrated circuits
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