Photooxidation of dimethyl sulfide and dimethyl disulfide. II: Mechanism evaluation |
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| Authors: | Fangdon Yin Daniel Grosjean Richard C Flagan John H Seinfeld |
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| Institution: | (1) Department of Chemical Engineering, California Institute of Technology, 91125 Pasadena, CA, U.S.A. |
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| Abstract: | The mechanisms for atmospheric photooxidation of CH3SCH3 and CH3SSCH3 developed in Part I are evaluated by a series of outdoor smog chamber experiments. Measured product yields, including SO2, H2SO4, CH3SO3H and HCHO, are reported. The predictions of the mechanisms developed in Part I are found to be in substantial agreement with the measured concentrations from the smog chamber. By comparison of mechanism predictions and observations, critical uncertainties in the mechanism are identified. |
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| Keywords: | Dimethyl sulfide dimethyl disulfide photooxidation mechanism outdoor smog chamber experiments computer simulations |
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