直流弧光放电等离子体CVD金刚石薄膜中的晶体类型与特征

采用自主研制的直流弧光放电等离子体CVD设备，以甲烷和氢气为气源，在YG6硬质合金基体上制备出主显晶面为（100）、（111）以及纳米晶粒的金刚石薄膜涂层。SEM观测其晶体类型主要为立方体、八面体、立方八面体，其中以立方八面体为主。随着碳源气体浓度的增加，金刚石晶体的形态会呈现从八面体一立方八面体一立方体顺序转变的趋势；而薄膜的表面形貌呈现从主显（111）晶面-（111）与（100）晶面混杂-主显（100）晶面顺序转变的特征。此外，CVD金刚石薄膜中还存在有许多类似接触孪晶、贯穿孪晶、复合孪晶，以及球形或聚晶晶粒形态的晶体，并且多数孪晶属于类似（111）复合孪晶结构。

CRYSTAL MORPHOLOGY AND FEATURE OF THE DIAMOND FILMS BY DC ARC DISCHARGE

Polycrystalline diamond films with surface morphology of {100} and {111} facets were synthesized on a abraded cemented carbide tungsten tool from a gas mixture of methane and hydrogen by DC arc discharge plasma CVD . The morphology of diamond film observed by SEM. Showed that with increasing carbon gas concentration,the film morphology changed from {111} to {100} and the diamond particle shape varied from octahedron to cubic. There also exist a lot of twin-like particles and ballas type particles in the diamond films.