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Silicon negative ion chemistry in the atmosphere-in situ and laboratory measurements
Authors:A.A. Viggiano  F. Arnold  D.W. Fahey  F.C. Fehsenfeld  E.E. Ferguson
Affiliation:Max-Planck-Institut für Kernphysik, Heidelberg, W. Germany;Aeronomy Laboratory, NOAA Environmental Research Laboratories, Boulder, CO 80303, U.S.A.
Abstract:The results of a rocket-borne mass spectrometer measurement indicate that large concentrations of negative ions exist above the bottom of the atmospheric atomic oxygen layer. A large majority of these ions have a mass greater than 100 amu. In addition, an ion at mass 76 was observed with concentrations too large to be CO4?. In order to explain these features, a number of reactions involving silicon oxide negative ions have been measured in a flowing afterglow system. The ion SiO3? is produced by reaction of O3?, and CO3?, with SiO. The SiO3? ion is extremely stable and does not react measurably with NO, NO2, CO, CO2, O3 or O. Since meteoroid ablation produces a large silicon input into the atmosphere, it appears possible that the ions observed at mass 76 may be SiO3?. Possible production mechanisms for this ion as well as the heavy ions are discussed.
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