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Experimental determination of U and Th partitioning between clinopyroxene and natural and synthetic basaltic liquid
Authors:T.Z. LaTourrette  D.S. Burnett
Affiliation:

aDivision of Geological and Planetary Sciences, California Institute of Technology, Pasadena, CA 91125,USA

Abstract:Clinopyroxene-silicate liquid partition coefficients for U and Th have been determined by particle track radiography from 1 atm crystallization experiments at controlledfO2. Two natural basaltic and one synthetic composition were studied atfO2 values from the NiNiO oxygen buffer to 1 log unit more oxidizing than FeFeO (IW+ 1). Over the range offO2 values and compositions studied,DUcpx/liq = 0.0034–0.015,DThcpx/liq = 0.008–0.036, andDThDU= 3.4–1.1. With decreasingfO2,DThDU can decrease by up to a factor of 3 for a given composition, primarily from an increase inDUcpx/liq, which we interpret as resulting from an increase in the proportion of tetravalent U in the system with decreasingfO2. This demonstrates that crystal-liquid UTh fractionation isfO2 dependent and that U in terrestrial magmas is not entirely tetravalent.DThcpx/liq appears to decrease in the two basalts at the lowestfO2, possibly as a result of changes in composition withfO2.

Our data show the sense of UTh fractionation by clinopyroxene-liquid partitioning is consistent with previous experimental determinations, in thatDThcpxDUcpx> 1 in all cases. This indicates that, during partial melting, the liquid will have aTh/U ratio less than the clinopyroxene in the source. The observed238U230Th disequilibrium in MORB requires that the partial melt should have aTh/U ratio greater than the bulk source, and, therefore, cannot result from clinopyroxene-liquid partitioning. Further, the magnitudes of the measured partition coefficients are too small to generate significant UTh fractionation in either direction. Assuming that clinopyroxene contains the bulk of the U and Th in MORB source, our results indicate that238U230Th disequilibrium in MORB may not be caused by partial melting at all.

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