An interconnect width and spacing optimization model considering scattering effect

As the feature size of the CMOS integrated circuit continues to shrink, the more and more serious scattering effect has a serious impact on interconnection performance, such as delay and bandwidth. Based on the impact of the scattering effect on latency and bandwidth, this paper first presents the quality-factor model which optimises latency and bandwidth effectively with the consideration of the scattering effect. Then we obtain the analytical model of line width and spacing with application of curve-fitting method. The proposed model has been verified and compared based on the nano-scale CMOS technology. This optimisation model algorithm is simple and can be applied to the interconnection system optimal design of nano-scale integrated circuits.     

Statistical Elmore delay of RC interconnect tree

As feature size keeps scaling down, process variations can dramatically reduce the accuracy in the estimation of interconnect performance. This paper proposes a statistical Elmore delay model for RC interconnect tree in the presence of process variations. The suggested method translates the process variations into parasitic parameter extraction and statistical Elmore delay evaluation. Analytical expressions of mean and standard deviation of interconnect delay can be obtained in a given fluctuation range of interconnect geometric parameters. Experimental results demonstrate that the approach matches well with Monte Carlo simulations. The errors of proposed mean and standard deviation are less than 1% and 7%, respectively. Simulations prove that our model is efficient and accurate.