Degradation of Phenol in Aqueous Solution by Fenton,Sono‐Fenton and Sono‐photo‐Fenton Methods

The present work focuses on the performance of Fenton, sono‐Fenton, and sono‐photo‐Fenton processes for the oxidation of phenol present in aqueous solution. The effects of H₂O₂ concentration, Fe²⁺ concentration, pH, and initial phenol concentration on the oxidation of phenol were studied. The optimum Fe²⁺ and H₂O₂ concentrations for the Fenton process were 45 and 800 mg/L, respectively. For the sono‐Fenton process, the optimum Fe²⁺ and H₂O₂ concentrations were 30 and 800 mg/L, respectively. The optimal conditions for the sono‐photo‐Fenton process were found to be 20 mg/L of Fe²⁺ and 700 mg/L of H₂O₂. The optimum pH was found to be 3 for the processes investigated in the present study. The analysis of results showed that the sono‐photo‐Fenton method reduced the Fe²⁺ concentration by 30–50% and the H₂O₂ concentration by 12.5%. It was found that the sono‐photo‐Fenton technique showed better performance than the Fenton and sono‐Fenton processes for the oxidation of phenol. A lumped kinetic model was used to predict the chemical oxygen demand reduction and the model was found to fit the data.