透射式微焦点X射线源钨-金刚石靶材的制备及其性能研究

本文采用磁控溅射镀膜技术制备了钨-金刚石透射靶材,借助电子扫描电镜对靶材的钨薄膜进行微观形貌分析。同时借助YXLON光机,研究自制靶材在X射线出射率及其产生X射线所需消耗功率和寿命等性能,并与YXLON原带靶材进行性能比较。研究表明,采用磁控溅射制备的钨薄膜与YXLON靶材上的钨薄膜具有相似的表面形貌;在YXLON光机相同工作条件下,自制靶材的X射线出射率略高于YXLON原带靶材的X射线出射率的1%,二者辐射X射线所需的功率相差无几,自制靶材的寿命要长于YXLON靶材的。这表明自制钨-金刚石靶材能够满足微焦点射线源所需的高质量靶材的应用要求。 

Research on the Preparation and Performance of Tungsten-diamond Transmission Target for Microfoucs X-ray Source

The present paper designed a basic structure of tungsten-diamond transmission target, according to the theoretical model of the end-window transmission target formicro-focus X-ray source.The tungsten-diamond transmission targetis prepared by magnetron sputtering deposition technology. The microstructure of tungsten filmis analyzed by scanning electron microscope. The performance of tungsten-diamond transmission target is carried out on the X-ray tube of YXLON, and the performance is compared to that of YXLON.The experimental results show that the surface morphology of homemade targetis similar to that of YXLON.Under the same operating conditions,the X-ray emitting efficiencyis slightly higher about one percent than that of YXLON and the corresponding X-ray production powerof them is little difference, and the lifetime of homemade targetis longer than that of YXLON. All the above mention results indicate that homemade target could be satisfied the application requirements of high quality target formicro-focus X-ray source.