离子刻蚀全息光栅的研究

利用国产的光刻胶和国产离子刻蚀机在蒸镀的铝基衬底上进行刻蚀全息光栅,在国内是一项较新的技术。本文介绍和论述了该试验工作的工艺过程、参数计算和测试方法,得出了试验结果和参数计算值基本吻合的结论,并指出了进一步改善质量的方向。

Research for Etching Holographic Grating by the Ion Beam

According to the principle of separating amplitude of light wave, it is possible to give two beams of light that are able to interfere. At first, the ralief phase shift holographic grating is produced on a glass plate, on which a layer of aluminium has been evaporated, and then it is coated with thinner film of photoresist. After that the scintillating grating for the directive is microfabricated by the Ar-ion beam etching. There is no pariodic error on this grating. So far this technique is new in our country.We have made some experiments about the character of the photoresist PB-212 produced in our nation in the holographic exposure, development and etching by the collimated Ar-ion beam. In particular, the techniques of the etching Al-grating and the measure methods are investigaed.This paper descrebes the technetogy procedure mentioned above, discusses the calculation methods of the technical parameters, reports the results of the experiments and investigations. At the end of this paper, it is pointed out that the results of the experiments agree with calculation values and the future improvements.