Surface study of HF- and HFH2SO4-treated feldspar using Auger electron spectroscopy

Auger electron spectroscopy has been used to study K-feldspar that has been reacted with both aqueous 10% HF and a 50% mixture of a 10% HF/0.1 N H₂SO₄ solution. In the feldspar/HF system, the resulting feldspar surface was shown to have been fluorinated; depth profiling, using argon ion sputtering, showed the fluorination to have occurred substantially into the mineral bulk. In the feldspar/ $\text{HF}\text{H}{}_2\text{SO}{}_4$ system, the resulting surface contained both fluorine and sulfur. The fluorination had again penetrated into the bulk, but the sulfur could be removed with mild argon ion sputtering. The $\text{Al}\text{F}$ signal ratio was much lower on the feldspar surface treated with the 10% HF/0.1 N H₂SO₄ solution than the feldspar surface treated with the weaker 10% HF acid solution.