Study of the structure of silica film by infrared spectroscopy and electron diffraction analyses |
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| Authors: | Tomonari Morioka Seiji Kimura Noritoshi Tsuda Chihiro Kaito Yoshio Saito & Chiyoe Koike |
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| Institution: | Department of Physics, Ritsumeikan University, Kusatsu-shi, Shiga 525-8577, Japan,;Department of Electronics and Information Science, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606, Japan,;Kyoto Pharmaceutical University, Yamashina-ku, Kyoto 607, Japan |
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| Abstract: | Amorphous silicon oxide films have been studied on the basis of electron diffraction (ED) analyses and infrared (IR) spectroscopy in order to elucidate the relationship between the structures. After the heat treatment of the film in air at 300 and 500°C, the ED pattern showed halo rings, and the IR spectra clearly changed. Intensity analysis of the ED pattern provided evidence for the structural change of the amorphous film. It was concluded that the spectral changes in the ranges of 9.2–10.2, 12.5–13.5 and 19.5–22.5 μm were the result of phase transitions of the microcrystallites of α-cristobalite to β-cristobalite, and α- or β-quartz. Astrophysical implications have been discussed. |
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| Keywords: | line: identification instrumentation: miscellaneous techniques: miscellaneous circumstellar matter dust extinction infrared: general |
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