首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Dynamics of the transport of the phosphorus and silicon at the water-bottom boundary in the Baltic Sea
Authors:MM Domanov  EG Vodianaia  
Institution:aP. P. Shirshov Institute of Oceanology, Russian Academy of Sciences, Moscow, Russia
Abstract:The study of the fine structure of the phosphorus and silicon distribution in near-bottom layers and in the interstitial water of the sediments has been carried out in the different Baltic Sea regions (Gulf of Finland, Bornholm, Gotland). The data of this study are used to calculate the flows and effective transport coefficients for mineral phosphorus and silicon exchange processes between sediment and near-bottom layer. The values of nutrient flows varied depending on sediment type from 9.8 to 632 μg-at. m−2 year−1 for phosphorus and from 232.4 to 1881.1 μg-at. m−2 year−1 for silicon. The dependence of the effective transport coefficients versus the distance from the bottom (h) is expressed by empirically-derived equation: Keff = Ah−b. The values of constants “A” and “b” depend on the hydrochemical conditions, sediment type and hydrophysical conditions in the near-bottom layers. Calculated constants for regions are discussed.
Keywords:Near-bottom layer  eutrophication  phosphorus  silicon
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号